Kaufman & Robinson (KRI)

KRI has developed a wide range of broad-beam industrial ion sources with the latest being the versatile EH 1000 End Hall ion source.

They are also the inventor and owner of patented gridless end-hall technology. Currently KRI holds 23 Patents in ion beam technology with 10 pending patents.

EH-1000, 8cm Ion Beam Source
EH- 400, 3cm Ion Beam Source
Hollow Cathode Neutralizer

KRI Ion Sources are ideal for substrate precleaning prior to physical vapor deposition. A low energy high current beam of ions can also be used for physical assist during thin film production. The Griddess Ion Source design allows for coverage over large areas. Pure beams of oxygen can be used to react metals into oxides for high rate and high purity thin film deposition. The KRI source can be configured for completelly filamentless operation, allowing the ion source to run for hundreds of hours on long coating runs. Intlvac has used to the source to develop Diamond like carbon single layer IR films by direct deposition of carbon using a hydrocarbon gas.

Pure Nitrogen beam with a Hollow Cathode Neutralizer 3 amp at 150 Volts

Pure Argon beam with a Hollow Cathode Neutralizer 10 amps at 150 volts

Pure Oxygen beam with a Hollow Cathode Neutralizer 10 amps at 150 Volts