Nanoquest I R&D

The Nanoquest I ion beam etching system is an ideal platform for etching single wafer substrates up to 6". Configured with a high cooling flow substrate stage, the system can etch through a photo resist or other masks to produce patterned substrates on any material.

The system is housed in a compact one-piece frame with integral electronics rack to minimize lab or clean room space. High vacuum design principles ensure quick cycle times and low ultimate pressure performance. UHP Gas distribution ensures stable ion source operation.

The chamber is a 20” diameter, 20” deep cylinder with a hinged front door and welded stainless steel cooling passages.The substrate stage is mounted on the door. It has a stainless steel frame with integral instrument rack. Includes rack mounted touch screen PLC controller for automated: pump down, gas flow control, and ion source operation.

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