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Reconditioned Millenion IDM 1200
Modular Ion Beam Optical Deposition System

Chamber
The process chamber utilizes an all stainless steel construction with integrated water-cooling channels. It also comes equipped with all necessary ports for pumping, substrate fixturing, end-point detection, feedthroughs, and viewing and auxiliary equipment. The process chamber also has full-sized hinged doors for easy access to substrates, stage assembly, target assembly, and RF ion sources.

Ion Sources & Power Supplies
System includes two separate 12cm inductively coupled RF ion sources with molybdenum self-aligning grids and high Curie point permanent magnets, each capable of 400mA max ion beam current; 100-1000eV beam voltage Neutralization is achieved with two plasma bridge electron sources (PBES) for neutralization. Power is supplied by a modular 1.8 MHz power supply with automatic matching network and LED display and remote

Load-Lock & Substrate older
Linear action load-lock substrate transfer system with independent high vacuum and mechanical pumps; variable incidence angle; variable rotation speed, and mechanical clamping fixturing. The water-cooled platen, which minimizes substrate temperature, can accommodate substrates up 6" diameter.

Vacuum System
TMH 1601 dual turbo molecular drag pump, 1500 l/s each, corrosive preparation, complete with T configuration and CTI water pump.

Target Assembly
Six-sided × 14" target assembly holds with backing plate in a tri-paddle configuration. Assembly is mounted on port through top of chamber and is easily accessible through hinged door. It also features an integrated copper cooling block and target shields to prevent contamination.

Gas Handling
The integrated gas panel is capable of holding up to eight mass flow controllers; calibrated for O2, Xe, or Ar process gases and N2 background gas.

In-Situ Optical Monitor, Intellimetrics
Integrated reflectance sensor is used to measure optical path length of alternating films. Also features optical modeling to determine precise time for ¼ wave stack deposition and real-time measurements using sample coupon.

System Automation
Full process and system computer control via rack mounted Pentium PC industrial Computer with touchpad/keyboard in a lockable cabinet drawer. System operates on user-friendly Windows-based software with fully automated process control, monitoring, and verification.
 

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