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Nanochrome® II Automatic Load Lock

Intlvac’s PVD systems are now available with an automated load locked substrate transfer option.  Ideal for runs that are short, the load lock allows the main chamber to remain at high vacuum, while substrates are removed or loaded.  The classic Intlvac “clam shell” design accommodates either a single substrate platen or up to a 5 platen assembly.

The Nanochrome II Physical Vapor Deposition System with Load Lock

Our single platen assembly is ideal for high uniformity runs, with optional optical monitoring directly through the parts being coated.  Used with either sputter sources or a large electron beam gun, the system can stay under high vacuum for weeks.

The multi-platen design allows you to still use a double axis planetary with the benefits of a system that is rarely vented to atmosphere.

Huge benefits await when you switch to a load locked system:

  • Reduced pump down time
  • Increased through put
  • Increased film quality
  • Reduced particulate generation
  • Reduced or eliminated conditioning times for materials
  • Greater stability and repeatability of coatings


> Download PDF of Nanochrome® II Load Lock Brochure.
> Download Adobe Acrobat Reader