Vacuum Systems - Intlvac

	Nanoquest Ion Beam Systems Nanoquest I R&D The Intlvac Nanoquest I Ion Beam Etching System is an idea platform for etching single wafer substrate up to 4". Configured with a high cooling flow substrate stage, the system can etch though a photo resist mask to produce patterned substrates on any matieral. More Information. Nanoquest I Load Lock Ion Beam Etch The Intlvac Nanoquest I Load Lock Ion Beam Etching system is an idea platform for etching single wafer substrate up to 3". Configured with a high cooling flow substrate stage, the system can etch through a photo resist mask to produce patterned substrates on any matieral. More Information. Nanoquest I Load Lock Ion Beam Sputter Deposition The Intlvac Nanoquest I Load Lock Ion Beam Sputter Deposition system is an idea platform for multilayer deposition of thin films onto single wafer substrates up to 3". A three paddle sputter target carousel allows multilayer deposition of films that are not easily deposited by other physical vapor deposition techniques. More Information. Nanoquest II Batch Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room. System components, such as shields and other serviceable items, are easily accessed in the service area. A double door etch module allows servicing from either side of the chamber. UHV design rules ensure that the etch module achieves very low base pressures. More Information. Nanoquest II Load Lock The Nanaoquest II load lock system uses a magnetically coupled rotary linear drive to safely transport a wafer, that has been mounted to a carrier platen, into the etch chamber. A remote video viewing system allows the carrier to be monitored during the transfer, from the clean room side of the system. More Information. Nanoquest III Batch The Nanoquest III Batch Ion Beam System is one fo the most economical and versatile production ion beam etch system on the market today. The system allows precise control of ion beam energy, and etch angle automatically. More Information.