HomeAbout IntlvacContact UsSite Map
Nanoquest
Nanochrome
Other
Systems
Services
Services
 

 

Nanoquest I Load Lock Ion Beam Sputter Deposition

Nanoquest I Load Lock Ion Sputtering System for multi-layer thin film deposition The Intlvac, Nanoquest I Load Lock Ion Sputtering System is an idea platform for multilayer deposition of thin films onto single wafer substrates up to 3".   A three paddle sputter target carousel allows multilayer deposition of films that are not easily deposited by other physical vapor deposition techniques.  Configured with a high cooling flow substrate stage, the system can deposit thin films at low temperatures allowing for finer film grain sizes.   Any materials including those with magnetic properties may be deposited.

LabVIEW interface for total control over your ion beam sputtering depostion processes Ion beam sputter deposition produces a higher velocity deposition plume which improves some film characteristics.   Some films like Silver will adhere to surfaces without adhesion layers.

The unique design of the stage allows it to rotate and tilt the substrate during deposition while maintaining a high rate of cooling in a high vacuum environment. Substrates are bonded onto a substrate carrier that transfers to stage surface without the use of tape or greases.

A Vertical Load Lock design keeps the chamber under high vacuum and reduces cycle times. A unique transfer assist controls the movement of the wafer transfer and prevent mishandling.

Deposition chamber with door mounted water-cooled substrate stage The system is housed in a compact one-piece frame with integral electronics rack to minimize lab or clean room space. High vacuum design principles ensure quick cycle times and low ultimate pressure performance. UHP Gas distribution ensures stable ion source operation.

The chamber is a 26” diameter, × 24” long cylinder with a hinged front door and welded stainless steel cooling passages. Substrate stage is door mounted. Stainless steel frame with integral instrument rack. Rack mounted touch screen with LabView interface, and Either Net microcontrollers allow for automated: pump down, pressure control, gas flow control, and ion source operation.

The system can be configured with 3cm D.C. sputter source and can use a  5cm R.F., or 8cm D.C Kaufman style gridded ion sources for simultaneous precleaning or ion assisted deposition.

 

> Download PDF of Nanoquest I Load Lock Brochure.
> Download Adobe Acrobat Reader