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OLED System : Dual Chamber Evaporator
Dual Chamber Thermal Vacuum Evaporation and Electron
Beam Evaporation System
Intlvac’s OLED System is designed for
dual chamber evaporation in a high vacuum loadlock with material
handling in an atmosphere-controlled glovebox.
The
first chamber is capable of evaporating by resistance evaporation
from six different evaporation sources. A very high level of controlled
evaporation is possible for materials that are temperature sensitive
through a closed loop control system. The system allows co-deposition
between one pair of Low Temperature Evaporation Sources designed
for OLEDs, co-evaporation allows material mixing (four OLED sources
in total). One pair of evaporation sources has special shielding
to allow for high temperature thermal evaporation of platinum
and other metals.
The second chamber is configured for co-evaporation
between two 15cc single pocket electron beam guns with a gridless
and filamentless ion source that provides an oxygen ion beam for
assist.
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The loadlocks have a fixture for holding one
6” wafer, or flat pieces of glass. A water cooled substrate
holder made from OFHC copper is held in a 12” “squashed”
half sphere chamber. The top chamber is on a hinge assembly and
moves 180 degrees when opened to allow substrate mounting. Substrates
such are full sized 150mm/6” wafers or smaller.
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