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By using a broad-beam ion source instead of a focused beam to mill target substrates, a high degree of edge-to-edge uniformity can be achieved.
Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics and Semiconductors.
The Nanoquest I Ion Beam Etching system is an ideal and versatile platform for etching single wafer substrates up to 6".
Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.
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