ABOUT | TECHNICAL SUPPORT | RESOURCES | TEL: 800.959.5517
A flux of focused high energy ions, are used to create trenches in a substrate by directing them through a mask material.
The Nanoquest I Ion Beam Etching system is an ideal and versatile platform for etching single wafer substrates up to 6".
Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.
LOGIN | REGISTER |