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+1 800-959-5517

Controlled Temp Growth

Precision control of substrate temperature allow for creation of specific grain sizes, crystal structures/orientations, or stochiometric states of co-deposited materials. The ability to hold growing films at desired temperatures can assist in stress control, self-assembly of layers, defect relaxation, and temperature dependent reactive processes as well.

Controlled Temp Growth

Nanochrome I

Nanochrome I is an R&D / Pilot Electron Beam Evaporator with a variety of possible configurations.

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Nanochrome II

Nanochrome II is the ideal platform for high temperature PVD processes. The system can be configured for a wide variety of deposition sources.

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Nanoquest Pico

The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics and Semiconductors.

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Nanoquest I

The Nanoquest I Ion Beam Etching System is an ideal platform for etching single wafer substrates up to 6".

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Nanoquest II

Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.

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Nanoquest III

The Nanoquest III Batch Ion Etching System is one of the most economical and versatile production ion beam etch systems on the market.

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Diamond Like Carbon

The DLC's unique design and processes allow for numerous consecutive coating runs before any maintenance is required to maximize your throughput.

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Pleiades Cluster System

The Pleiades (Seven Sisters) Cluster System is designed to combine multiple Nanoquest and Nanochrome chambers. It offers a large range of applications and the possibility to combine different deposition technologies within separate chambers.

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