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Intlvac can create high-quality single or multi-layer films of nearly any metallic element or alloy using a variety of deposition techniques including evaporation and sputtering.
The MIDAS Metalization System is designed to produce a single or multi-layer symmetrical metal coating on ends, mid spans or windows of optical fibers.
The Nanochrome Pico is the ultimate all-purpose prototyping and R&D physical vapor deposition (PVD) platform on the market.
Nanochrome I is an R&D / Pilot Electron Beam Evaporator with a variety of possible configurations.
The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics and Semiconductors.
The Nanoquest I Ion Beam Etching system is an ideal and versatile platform for etching single wafer substrates up to 6".
Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room.
The Nanoquest III Batch Ion Beam Etching System is one of the most economical and versatile production ion beam etch systems on the market.
Nanochrome II is the ideal platform for high temperature PVD processes. The system can be configured for a wide variety of deposition sources.
The Nanochrome IV PARMS system produces dielectric thin film layers with final reaction and film densification at the substrate surface using a high current.
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