Nanochrome IV PARMS

nanochrome iv

The Nanochrome™ IV PARMS (Plasma Assisted Reactive Magnetron Sputtering), produces dielectric thin film layers by reactive magnetron sputtering with final reaction and film densification at the substrate surface using a high current, low energy ion source. Reactive operation results in faster deposition times. Low pressure sputtering achieves higher deposition rates.

Oxides that have been produced include tantalum, niobium, titanium, aluminum, germanium and silicon with typical rates of 3 - 5 A/s. Uniformity is less than 2% for 250 mm diameter. The films are suitable for the UV, VIS NIR, SWIR, and MWIR ranges. The system also produces transparent conductive AZO and ITO.

Key Benefits
thin film coatings

  • Exceptional process repeatability
  • Stable deposition rates
  • High quality oxide and nitride deposition
  • Capable of producing films with high layer count
  • Optional load-lock operation

Reactive Sputtering

Nanochrome ion source in operationFilms are made reactively from metal targets to produce highly dense, pure oxides and stoichiometric nitrides. The system uses either pulsed DC for operation with single cathodes, or low frequency AC. 



Optical Endpoint Monitoring

The Nanochrome™ IV PARMS optical endpoint monitoring offers:  optical endpoint monitoring
• onboard reoptimization
• 350 to 1650 nm optical controlrange
• ability to import designs from all major commercial optical design software
• ideal for broadband AR, V coat, step filter, notch filter, multiband pass


Load Lock

load lockAn optional manual or fully automatic load-lock may be added to the system to reduce pump down and venting times. The load-lock is useful when performing large production quantities of shorter runs. With load-lock, pump down time is under 10 minutes. 



Download Brochure NCIV PARMS brochure

For more information about creating a custom solution for your application, contact or 1.800.959.5517