The Nanochrome™ IV PARMS (Plasma Assisted Reactive Magnetron Sputtering), produces dielectric thin film layers by reactive magnetron sputtering with final reaction and film densification at the substrate surface using a high current, low energy ion source. Reactive operation results in faster deposition times. Low pressure sputtering achieves higher deposition rates.
Oxides that have been produced include tantalum, niobium, titanium, aluminum, germanium and silicon with typical rates of 3 - 5 A/s. Uniformity is less than 2% for 250 mm diameter. The films are suitable for the UV, VIS NIR, SWIR, and MWIR ranges. The system also produces transparent conductive AZO and ITO.