The Nanoquest III Batch Ion Beam Etching System is one of the most economical and versatile production ion beam etch system on the market today. The system allows precise control of ion beam energy, and etch angle automatically. Designed as a production etch tool, the Nanoquest III is capable of performing processes ranging from simple inert etch to complex reactive operation. The use of 5 hollow shaft rotary drives brings water cooling directly underneath each of the double rotating wafer planets.
The Nanoquest III system combines the water-cooled double axis stage with a 22 cm ion beam from a RF ion source and secondary ion mass spectrometery for end point detection. System operation and display is through Intlvac's graphical display running under LabVIEW.
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