Nanochrome™ I R&D Load-Lock system is capable of evaporating materials such as metals and dielectrics by Electron Beam Evaporation from a four or six pocket electron beam gun, onto a direct water cooled rotating substrate stage. Stepper motors allow automatic variable angle deposition as well.
The stage angle adjustment allows the system to be used for multi-layer electron beam evaporation, magnetron sputtering, and ion beam etching all during the same pump down cycle.