R & D Systems

Nanoquest Pico

The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics, and Semiconductors. It can be configured for a number of ion sources and gases depending on your application. With its 14” D-shaped chamber and small footprint, it can fit into any lab.

Nanoquest I

The Nanoquest I ion beam etching system is an ideal platform for etching single wafer substrates up to 6". Configured with a high cooling flow substrate stage, the system can etch through a photo resist or other masks to produce patterned substrates on any material.

Nanoquest I - LL

The Nanoquest I Load-Lock Ion Beam Etching System is an ideal platform for etching single wafer substrates up to 4". Configured with a high cooling flow substrate stage, the system can etch through a photo resist mask to produce patterned substrates on any material. We can keep your substrate below 50 deg C with high beam current densities. Direct water cooling is achieved using two hollow shaft ferro fluid feed through, and motion is accomplished with stepper motors for rotation and tilt.

Nanoquest I - LL Sputter

The Nanoquest I Load-Lock Ion Sputtering System is an ideal platform for multilayer deposition of thin films onto single wafer substrates up to 4".

Nanoquest II

Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room. System components, such as shields and other serviceable items, are easily accessed in the service area. High speed vacuum pumps not only provide a fast pump down, but also reduce ion beam gas collisions.

Nanoquest II - LL

Designed for clean room operation, the Nanoquest II keeps the etch module in the service area of the clean room. A double door etch module allows servicing from either side of the chamber. UHV design rules ensure that the etch module and load-lock chamber achieve very low base pressures.