Nanoquest I

nanoquest i

The Nanoquest I ion beam etching system is an ideal platform for etching single wafer substrates up to 6". Configured with a high cooling flow substrate stage, the system can etch through a photo resist or other masks to produce patterned substrates on any material.

The system is housed in a compact one-piece frame with integral electronics rack to minimize lab or clean room space. High vacuum design principles ensure quick cycle times and low ultimate pressure performance. UHP Gas distribution ensures stable ion source operation.

stagerf ion sourceSiO2 passivation

The chamber is a 20” diameter UHV designed assembly.  The substrate stage is mounted on the door and it presents the substrate to the ion source at various angles and rotational speeds.

The system has a stainless steel frame with integral instrument rack, which houses a touch screen LabView interface to the PLC controller. Completely automated; pump down, gas flow control, and ion source operation, provides repeatable and reliable etching for your substrates.

Process Methods

  • Ion Beam Etching
  • Ion Beam Assisted Deposition (IBAD)
  • Ion Beam Sputter Deposition     
  • Reactive Ion Beam Deposition (RIBE)
  •  Chemically Assisted ion Beam Etching (CAIBE) 
 


Applications

Magnetic Materials          Multi-layer Materials         
SemiconductorsOptoelectronics

 

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