The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics, and Semiconductors. It can be configured for a number of ion sources and gases depending on your application. With its 14” D-shaped chamber and small footprint, it can fit into any lab.
The Nanoquest Pico is designed to etch small wafers and dies and is ideal for fast etching of thin films that do not respond well to conventional chemical or dry etching processes.
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SUBSTRATE FIXTURING: Rotating cooled substrate holder 0 - 10 RPM.
SUBSTRATE SIZE: Up to 100mm diameter
ION MILLING:
1cm DC Ion Source - 10mA beam current, up to 500eV Ion energy.
4cm DC Ion Source - Up to 120mA beam current and 1200eV ion energy, filament neutralizer.
4cm RFICP Ion Source - 150mA beam current, 100-1200eV ion energy, low energy remote neutralizer.
8cm DC Ion Source - 250mA beam current, 100-1200eV ion energy, filament neutralizer.