Nanochrome I - LL

Nanochrome™ I R&D Load Lock

Nanochrome™ I R&D Load-Lock system is capable of evaporating materials such as metals and dielectrics by Electron Beam Evaporation from a four or six pocket electron beam gun, onto a direct water cooled rotating substrate stage.  Stepper motors allow automatic variable angle deposition as well.

The stage angle adjustment allows the system to be used for multi-layer electron beam evaporation, magnetron sputtering, and ion beam etching all during the same pump down cycle.

load lockdisplaysputter cathodes

The system provides a very high level of controlled, safe evaporation for materials through manual operation or closed loop control system.  Pump down operation is fully automated by Intlvac’s “Syscon” controller.

Thermal radiation shields and material deposition shields allow for the system to operate within a very large range of temperatures.  The system achieves base pressures in the low 10-8 torr by using a combination of all dry vacuum pumps.

Process Methods

  • Ion Beam Assisted Deposition (IBAD)       
  • Multi-layered E-beam Deposition
  • Thermal Evaporation
  • Co-Evaporation
  • Planar Magnatron Sputtering
ebeam evaporation diagram                 ion assist diagram


  • Precision Optical Coating                       
  • Optical Filters            
  • Anti-reflective Coatings
  • Superconductors
  • Semiconductors
  • Dielectric Materials

For more information about creating a custom solution for your application, contact

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