Nanochrome® II


Multi Cathode Magnetron Sputtering System


The Nanochrome® II is an advanced automatic thin film sputter deposition system designed to produce high-quality metal thin films using magnetron sputtering combined with low-energy ion substrate cleaning.

Built with state-of-the-art technology and fully automated controls, the system delivers precise, repeatable material deposition for research and production environments.


Precision Deposition and Automated Control


The Nanochrome® II provides exceptional control over the deposition process through a closed-loop control system managed by Intlvac’s proprietary system controller.

Pump-down operations and key system functions are fully automated, ensuring reliable operation and consistent performance.

A proprietary human-machine-interface (HMI) provides intuitive access to system controls, operating parameters, and process monitoring.


Nanochrome® II

Multi Cathode Magnetron Sputter System

The Nanochrome® II is an advanced automatic thin film sputter deposition system designed to produce high-quality metal thin films using magnetron sputtering combined with low-energy ion substrate cleaning.

Built with state-of-the-art technology and fully automated controls, the system delivers precise, repeatable material deposition for research and production environments.


Precision Deposition and Automated Control

The Nanochrome® II provides exceptional control over the deposition process through a closed-loop control system managed by Intlvac’s proprietary system controller.

Pump-down operations and key system functions are fully automated, ensuring reliable operation and consistent performance.

A proprietary human-machine-interface (HMI) provides intuitive access to system controls, operating parameters, and process monitoring.



UHV Performance

The system utilizes completely dry pumping technology to achieve Ultra-High Vacuum (UHV) levels, enabling the deposition of extremely clean and high-quality thin films.

Multilayer thin films can be automatically deposited using:

  • Long-throw, low-pressure ion-assisted magnetron sputtering
  • Conventional sputtering in the millitorr pressure range

The system operates with a pulsed DC power supply, optimized for depositing multilayer metal and dielectric films.

Your Workhorse For Multilayer Thin Films Precision Sputtering UHV Deposition Advanced Materials Research Ion-Assisted Deposition Optical Coatings Oxide Thin Films


Exceptional Reliability and Longevity


On-Demand Customer Support


Easy-to-Learn Operating System


High Level of Control and Logging of All Operations
Designed with Serviceability in Mind


In-Situ Stress Monitoring