The Intlvac AEGIS DLC PECVD system produces uniformly dense films up to several microns thick across a wide range of substrates, including silicon (Si), germanium (Ge), sapphire, optical glasses, metals, plastics, and II-VI compounds. This advanced capability reduces material waste and minimizes vacuum process times, ultimately lowering costs.
Figure 1: Ultra-high uniformity achieved across substrates without the need for rotation mechanisms, ensuring consistent film quality from center to edge.