Intlvac Thin Film > Products & Technology

Nanoquest I

A versatile ion beam platform for R&D, designed to etch single wafers up to 5″. Equipped with high-flow cooling, it can etch through photoresist or other masks to create patterned substrates on virtually any material.

Nanoquest II

Delivers precise, repeatable dry etching of virtually any material—supporting universities and research institutions worldwide in advancing MEMS, optical, sensing, photonic, RF/microwave, passive power, biocompatible, and memory device research.

Nanoquest III/IV

The system allows precise control of ion beam energy, and etch angle automatically. Designed as a production etch tool, the Nanoquest III/IV is capable of performing processes ranging from simple inert etch to complex reactive operation.

Nanoquest PICO

Designed to etch small wafers and dies and is ideal for fast etching of thin films that do not respond well to conventional chemical or dry etching processes. Perfect for lab spaces where a small footprint is essential.

Aether Vacuum Degassing

Designed for rapid, consecutive degassing of small components for space-ready use by holding them under high vacuum while being baked by thermal radiation.

Ares TVAC

Featuring a horizontal chamber with dual access doors, multiple instrumentation ports, and automated control via Intlvac’s Autosys PLC, it provides reliable black body radiation heating and comprehensive data logging for space simulation testing.

Deimos TVAC

Control via Intlvac’s Autosys PLC, it provides oil-free high vacuum, black body temperature simulation from 150 K, and operational testing across a -120 °C to +120 °C range with full data logging and LabView interface.

Phobos TVAC

Our midsize thermal vacuum system, designed for testing a wide range of components in clean, dry-pumped high vacuum (<10⁻⁶ torr), it provides automated environmental control via Intlvac’s Autosys PLC with full data logging and LabView interface.

AEGIS Diamond-Like Carbon

The Intlvac Aegis Diamond-Like Carbon (DLC) PECVD system is a state-of-the-art DLC coating machine built to revolutionize your coating processes...

Nanochrome™ V: Advanced Sputtering

The Nanochrome™ V is a state-of-the-art system designed for Plasma-Assisted Evaporation and Sputtering...

Electra-UHV Sputtering Deposition

The Electra UHV Sputtering System by Intlvac is a compact, purpose-built platform engineered for advanced thin film deposition in ultra-high vacuum (UHV) environments...

Icarus Indium Solder Bump Deposition

The Intlvac Icarus Indium Solder Bump Deposition System is optimized for high-volume production, delivering rapid turnaround with exceptional repeatability.

MIDAS Optical Fiber Metalization

The MIDAS Metalization System is the industry-leading solution for producing single or multi-layer symmetrical metal coatings on optical fibers...

Nanochrome™ I R&D Load-Lock System

The Nanochrome™ I from Intlvac Thin Film is a high-performance R&D/Pilot Physical Vapor Deposition (PVD) system engineered for flexibility, precision, and ease of use.

Nanochrome™ II

Nanochrome™ II is the ideal platform for high temperature PVD processes. The system can be configured for a wide variety of deposition sources.

Nanochrome™ IV PARMS

The Nanochrome™ IV PARMS (Plasma Assisted Reactive Magnetron Sputtering) system stands as a true workhorse in the field of modern sputtering technology.

Nanochrome™ IV UV VIS

The Nanochrome™ IV UV VIS system will make complex optical filters via ebeam evaporation with ion assist under optical control for real time reoptimization ...

Nanochrome™ Pico

The Nanochrome™ Pico is the ultimate all-purpose prototyping and R&D physical vapor deposition (PVD) platform on the market.

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