Nanochrome I

Compact, Versatile PVD Platform for Research and Pilot Production

The Nanochrome™ I from Intlvac Thin Film is a high-performance R&D/Pilot Physical Vapor Deposition (PVD) system engineered for flexibility, precision, and ease of use. Designed with a small footprint, cost-effective operation, and multi-process capability, it’s an ideal solution for developing thin films across a wide range of advanced materials.

Nanochrome I

Compact, Versatile PVD Platform for Research and Pilot Production

The Nanochrome™ I from Intlvac Thin Film is a high-performance R&D/Pilot Physical Vapor Deposition (PVD) system engineered for flexibility, precision, and ease of use. Designed with a small footprint, cost-effective operation, and multi-process capability, it’s an ideal solution for developing thin films across a wide range of advanced materials.

Key Features

Electron Beam Evaporation using 4- or 6-pocket e-beam guns for precise material control

Variable Angle Deposition via stepper motor-controlled stage for multi-angle coating applications

Direct Water-Cooled Rotating Substrate Stage ensures thermal management and uniform film deposition

Multi-Process Operation during a single pump-down cycle:

  • Electron Beam Evaporation
  • Magnetron Sputtering
  • Ion Beam Etching

Why Choose the Nanochrome™ I?

 Superior Features:

  • Ideal for R&D labs and pilot production environments
  • Customizable for your material and process requirements
  • Compact, clean, and easy to operate
  • Multi-technique capability in a single platform

Optimized for Advanced Thin Film Applications

Whether your focus is precision optics, semiconductors, or dielectric coatings, the Nanochrome™ I enables high-quality thin film deposition for materials ranging from metals to complex dielectrics.

Intelligent Chamber Design

  • Clamshell-Style Vacuum Chamber for full access to internal components
  • All Stainless Steel Construction with electro-polished surfaces for ultra-clean operation
  • Three Strategically Placed Viewports for real-time monitoring of source and substrate
  • Left- or Right-Side Instrument Rack for ergonomic lab integration

Tailored Configurations for Your Workflow

Choose from a variety of substrate handling options to suit your specific deposition needs:

  • Flat Plate Planetary
  • Flip Fixture Planetary
  • Planetary Dome

Quartz Halogen Heaters and fully automated shutters provide total thermal and deposition control. Multiple PVD source options are available:

  • Thermal Evaporation Boats
  • Single & Multi-Hearth Electron Beam Guns
  • Magnetron Sputter Guns
Thin Film Production Powerhouse

Explore the Latest Nanochrome™ I Brochure

  • Ion Beam Assisted Deposition (IBAD) 
  • Co-Evaporation
  • Multi-layered E-beam Deposition
  • Thermal Evaporation
  • Planar Magnetron Sputtering

Nanochrome I system is an R&D/Pilot Physical Vapor Deposition System. A variety of configurations are possible, all tailored to your specific needs. With its small footprint, low cost, and ease of operation, the Nanochrome system is an ideal choice for your research or pilot project. Electron beam evaporation or Magnetron sputtering is used to produce thin films for: precision optical coatings, semiconductors & dielectric materials, and superconductors.

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