Mark I+ Gridless Ion Source

Precision Ion Beam Processing for Advanced Thin Film Applications

The Intlvac Thin Film Mark I⁺ Ion Source is a compact, radiatively cooled, gridless end-Hall ion source designed to deliver stable, high-current ion beams for demanding vacuum thin film applications. Optimized for reliability and ease of integration, the Mark I⁺ provides exceptional beam stability, low ion energy operation, and reduced maintenance — making it ideal for industrial and R&D thin film systems. 


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Mark I+ Ion Source

Mark I⁺ Ion Source – Compact Industrial Design

Mark I+ Gridless Ion Source

Precision Ion Beam Processing for Advanced Thin Film Applications

The Intlvac Thin Film Mark I⁺ Ion Source is a compact, radiatively cooled, gridless end-Hall ion source designed to deliver stable, high-current ion beams for demanding vacuum thin film applications. Optimized for reliability and ease of integration, the Mark I⁺ provides exceptional beam stability, low ion energy operation, and reduced maintenance — making it ideal for industrial and R&D thin film systems.   


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 Download Brochure     View Diagram  
Mark I+ Ion Source

Mark I⁺ Ion Source – Compact Industrial Design

Key Features


Gridless Design
  • No fragile grids
  • Reduced erosion
  • Contamination tolerant
  • Long operational stability
Radiatively Cooled

  • No water cooling
  • Simpler integration
High Current Density
  • Mean ion energy: 50–180 eV
  • Excellent for surface activation and densification
Self-Neutralizing
  • Minimal substrate charging
  • Suitable for insulating substrates
Compact & Lightweight
  • 68 mm length × 70 mm diameter
  • 0.9 kg total weight
  • Flexible mounting orientation

Applications

The Mark I⁺ Ion Source enhances film quality and process control in:

  • Optical coating densification
  • Ion-assisted deposition (IAD)
  • Pre-deposition substrate cleaning
  • Surface activation
  • Reactive oxygen processing
  • Nitride formation
  • Adhesion improvement layers

Applications

The Mark I⁺ Ion Source enhances film quality and process control in:

  • Optical coating densification
  • Ion-assisted deposition (IAD)
  • Pre-deposition substrate cleaning
  • Surface activation
  • Reactive oxygen processing
  • Nitride formation
  • Adhesion improvement layers

Technical Specifications


Parameter
Specification
Anode Voltage
50–300 V (Ar)

100–300 V (O₂)
Anode Current
0.2 – 1.0 A
Continuous Power
200 W
Peak Power
300 W (≤60 min duty cycle)


Maximum Ion Beam Current: Up to 350 mA

Parameter
Requirement
Operating Pressure
0.1 – 1.0 mTorr
Base Pressure
≤ 1 × 10⁻⁴ Torr
Gas Flow
2 – 20 sccm
Gases
Ar, O₂, N₂, inert gases


Recommended Pumping Speed: ≥ 700 L/s


Parameter
Value
Cooling
Radiative
Cathode
0.015” Tungsten Filament
Dimensions
68 mm × 70 mm
Weight
0.9 kg
Gas Inlet
1/8" Swagelok
Mounting
10-32 UNF

Beam Characteristics & Thermal Performance

    • Broad angular distribution
    • 20-40% Anode to Beam Current
    • Stable discharge across operation range 
    • Designed for reproducible film growth 
    • Peak operating temperature: 400–500°C
    • Typical cool-down (atmosphere): 90–120 minutes
    • No active cooling required


Designed for manageability 

The modular architecture allows:

    • Rapid anode assembly replacement
    • Easy filament change
    • Reduced chamber downtime
    • Space anode exchange capability
    • Typical cool-down (atmosphere): 90–120 minutes

Typical maintenance intervals are process-dependent, with filament lifetimes ranging from 1–6 hours depending on operating power. 

Why Choose Intlvac Thin Film?

Intlvac systems are engineered for precision, reliability, and long-term production stability. The Mark II⁺ integrates seamlessly into:

  • Custom vacuum deposition systems
  • Optical coating platforms
  • R&D thin film tools
  • Production-scale coating systems

By combining advanced plasma engineering with practical serviceability, Intlvac delivers reproducible, high-quality thin films with reduced downtime and simplified maintenance.


Why Choose Intlvac Thin Film?

Intlvac Thin Film systems are built for precision coating, research flexibility, and industrial reliability. The Mark I⁺ Ion Source integrates seamlessly intoIntlvac systems are engineered for precision, reliability, and long-term production stability. The Mark II⁺ integrates seamlessly into:

  • Optical coating densification
  • Ion-assisted deposition (IAD)
  • Pre-deposition substrate cleaning
  • Surface activation

We combine advanced plasma engineering with practical system design to deliver reproducible, high-quality thin films.  

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