Nanochrome IV UV VIS

The Intlvac Nanochrome™ IV UV VIS ion-assisted deposition system is the latest innovation in precision optical coating technology. Designed to deliver exceptional performance, the Nanochrome™ IV UV VIS enables the creation of complex optical filters through electron beam evaporation with ion assist under optical control. This allows for real-time re-optimization or operation using standard deposition controls.

The Nanochrome™ IV UV VIS system will make complex optical filters via ebeam evaporation with ion assist under optical control for real time reoptimization or via standard deposition controls.

Nanochrome IV UV VIS

The Intlvac Nanochrome™ IV UV VIS ion-assisted deposition system is the latest innovation in precision optical coating technology. Designed to deliver exceptional performance, the Nanochrome™ IV UV VIS enables the creation of complex optical filters through electron beam evaporation with ion assist under optical control. This allows for real-time re-optimization or operation using standard deposition controls.

The Nanochrome™ IV UV VIS system will make complex optical filters via ebeam evaporation with ion assist under optical control for real time reoptimization or via standard deposition controls.

 World's First 

with Intelligent Cryopump Technology

The Nanochrome™ IV UV VIS is the first production platform to feature the latest generation CTI variable-speed cryopump, offering unmatched performance and efficiency.

World's First

with Intelligent Cryopump Technology

The Nanochrome™ IV UV VIS is the first production platform to feature the latest generation CTI variable-speed cryopump, offering unmatched performance and efficiency.

Dual-Axis Rotation for Maximum Efficiency

Equipped with a planetary stage featuring dual-axis rotation and five 12-inch substrate carriers, the system achieves an impressive baseline uniformity of just 2%. Each planetary holder accommodates a 12-inch substrate or multiple smaller substrates, maximizing coating capacity during each cycle.

Key Benefits

  • Outstanding process repeatability
  • Baseline uniformity of 2%
  • Fully automated process control
  • Real-time re-optimization of film layers
  • Dual-axis rotation with five 12-inch substrate carriers

The Nanochrome™ IV UV VIS sets a new standard for precision optical coating systems, combining cutting-edge technology with user-friendly features for superior results in every application.

Advanced Optical Monitoring

The Nanochrome™ IV UV VIS utilizes a broadband optical monitoring system for real-time re-optimization of film layers. This system automates process control in both reflection and transmission modes. The Intlvac Nanocon interface provides seamless digital control, one-button automation, and real-time data logging of critical parameters. Its state-of-the-art deposition tools ensure precise process management and temperature control up to 275°C, enabling unparalleled consistency and performance.

Operator-Friendly Design

Designed with user convenience in mind, the Nanochrome™ IV UV VIS features three spring-loaded shutter viewports for direct observation of the evaporation source, high-current ion source, and sample stage. Additionally, a rotatable polarizer viewport with a periscope attachment allows safe viewing of the deposition source during operation. The system also supports real-time spectral monitoring with an adjustable range spanning 400 to 1500 nanometers.

UV VIS Optical Filter Production System

Explore the Latest Nanochrome™ IV UV VIS Brochure

  • Exceptional process repeatability
  • Baseline uniformity of 2%
  • 5-12" planets with dual-axis rotation
  • Operator-friendly

The Nanochrome™ IV UV VIS ion assisted deposition system will make complex optical filters via ebeam evaporation with ion assist under optical control for real time optimization or via standard deposition controls.

The broadband optical monitoring system provides automated process control in reflection or transmission mode.

State-of-the-art deposition supplies allow unparalleled control over running processes and temperature control up to 275°C.

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