Mark I+ Gridless Ion Source

Precision Ion Beam Processing for Advanced Thin Film Applications

The Intlvac Thin Film Mark I⁺ Ion Source is a compact, radiatively cooled, gridless end-Hall ion source designed to deliver stable, high-current ion beams for demanding vacuum thin film applications. Optimized for reliability and ease of integration, the Mark I⁺ provides exceptional beam stability, low ion energy operation, and reduced maintenance — making it ideal for industrial and R&D thin film systems. 


Mark I+ Ion Source

Mark I⁺ Ion Source – Compact Industrial Design

Key Features


Gridless Design
  • No fragile grids
  • Reduced erosion
  • Contamination tolerant
  • Long operational stability
Radiatively Cooled

  • No water cooling
  • Simpler integration
High Current Density
  • Mean ion energy: 50–180 eV
  • Excellent for surface activation and densification
Self-Neutralizing
  • Minimal substrate charging
  • Suitable for insulating substrates
Compact & Lightweight
  • 68 mm length × 70 mm diameter
  • 0.9 kg total weight
  • Flexible mounting orientation

Applications

The Mark I⁺ Ion Source enhances film quality and process control in:

  • Optical coating densification
  • Ion-assisted deposition (IAD)
  • Pre-deposition substrate cleaning
  • Surface activation
  • Reactive oxygen processing
  • Nitride formation
  • Adhesion improvement layers

Technical Specifications


Parameter
Specification
Anode Voltage
50–300 V (Ar)

100–300 V (O₂)
Anode Current
0.2 – 1.0 A
Continuous Power
200 W
Peak Power
300 W (≤60 min duty cycle)


Maximum Ion Beam Current: Up to 350 mA

Parameter
Requirement
Operating Pressure
0.1 – 1.0 mTorr
Base Pressure
≤ 1 × 10⁻⁴ Torr
Gas Flow
2 – 20 sccm
Gases
Ar, O₂, N₂, inert gases


Recommended Pumping Speed: ≥ 700 L/s


Parameter
Value
Cooling
Radiative
Cathode
0.015” Tungsten Filament
Dimensions
68 mm × 70 mm
Weight
0.9 kg
Gas Inlet
1/8" Swagelok
Mounting
10-32 UNF

Beam Characteristics & Thermal Performance

    • Broad angular distribution
    • 20-40% Anode to Beam Current
    • Stable discharge across operation range 
    • Designed for reproducible film growth 
    • Peak operating temperature: 400–500°C
    • Typical cool-down (atmosphere): 90–120 minutes
    • No active cooling required


Designed for manageability 

The modular architecture allows:

    • Rapid anode assembly replacement
    • Easy filament change
    • Reduced chamber downtime
    • Space anode exchange capability
    • Typical cool-down (atmosphere): 90–120 minutes

Typical maintenance intervals are process-dependent, with filament lifetimes ranging from 1–6 hours depending on operating power. 


Why Choose Intlvac Thin Film?

Intlvac Thin Film systems are built for precision coating, research flexibility, and industrial reliability. The Mark I⁺ Ion Source integrates seamlessly into:

  • Optical coating densification
  • Ion-assisted deposition (IAD)
  • Pre-deposition substrate cleaning
  • Surface activation

We combine advanced plasma engineering with practical system design to deliver reproducible, high-quality thin films.