Water-Cooled Mark II Configuration

 The Water-Cooled Mark II Ion Source incorporates enhanced thermal management for processes requiring reduced substrate temperatures and shorter production cycle times.A specialized anode design promotes efficient heat transfer away from the vacuum chamber and substrates.

Key Advantages

•  Dramatically reduced substrate temperatures
• Elimination of cool-down prior to venting
• Greater ion beam stability and control

Operational Results 

•  Reduced film stress
•  Increased production throughput
• Improved reproducibility of film properties
  

 Mark II – HCES Configuration

 The Mark II can be configured with a Hollow Cathode Electron Source (HCES) to support extended reactive gas operation while maintaining consistent ionization and beam neutralization.This configuration is particularly suited for oxygen-intensive and long-duration reactive processes.When combined with the water-cooled anode, the Mark II-HCES provides the lowest operating temperature within the Mark II series.

Benefits 

•   Filamentless operation
•   Reduced contamination
•  Cooler source operation
•  Extended run times in reactive environments

 System Integration

The Mark II integrates into medium and large vacuum deposition systems, including:

•  Optical coating platforms
•  Production-scale ion-assisted deposition systems
• Reactive gas processing chambers
•  Large-area thin film tools

Its gridless end-Hall configuration enables stable plasma generation and controlled ion delivery across larger throw distances, supporting uniform film densification and repeatable process performance in industrial vacuum environments.