Introducing Intlvac Thin Film's NEWS OF THE WEEK

May 29, 2020
Join us each week as we take a peek behind the curtain of what is happening at Intlvac Thin Film.
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Seeing In The Dark and Other Unique Infrared Applications

Apr 06, 2020
Like many topics in the optics field, much of the current technology is merely a seed of a much higher potential whose breadth of applications hasn’t yet been fully realized. Infrared Optics is one of those topics, and its popularity and scientific investment has grown in recent years.
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Thin Film Coating with Tetraphenyl Butadiene (TPB)

Dec 09, 2019
In the process of thin film deposition, we produce layers nanometers to microns thick on a surface in order to impart specific properties not necessarily inherent in the bulk material.
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Nanofabrication Using Glancing Angle Deposition

Jul 03, 2019
Glancing angle deposition (GLAD) is a nanofabrication technique that is an extension of oblique angle deposition in which the substrate incline is manipulated during film deposition.
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Intlvac Thin Film Joins NanoCanada Mission to Toyko in January 2019

Dec 28, 2018
Intlvac Thin Film looks forward to participating in Nanotech Japan at Tokyo Big Sight on January 28 to February 1, 2019.
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Intlvac Introduces the Nanochrome IV UV VIS Optical Filter Production System

Sep 28, 2018
Intlvac Thin Film is pleased to introduce their newest precision optical coating platform, the Nanochrome IV UV/Vis Optical Filter Production System. The Nanochrome IV system is designed to produce complex optical filters, anti-reflective coating, dielectric and UV Vis filters via e-beam evaporation with ion assist.
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Advantages of Ion Beam Sputter Deposition

Aug 30, 2018
Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition method which utilizes a remote broad ion/plasma beam source to bombard a grounded (floating) target and sputter target material onto a substrate.
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Understanding Ion Beam Etching (Milling)

Jun 12, 2018
Ion Beam Etching (or Milling) is a dry plasma etch method which utilizes a remote broad beam ion/plasma source to remove substrate material by physical inert gas and/or chemical reactive gas means. Like other dry plasma etch techniques, the typical figures of merit apply, such as etch rate, anisotropy, selectivity, uniformity, aspect ratio, and substrate damage. However, ion beam etching advances additional dry etch merits, which include wide range of materials, precision etch stops, indiffere...
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What is Sputtering?

Apr 11, 2018
Sputtering is a thin-film manufacturing process widely used across many industries including semiconductor processing, precision optics, and surface finishing. Sputtered thin films have excellent uniformity, density and adhesion making them ideal for multiple applications.
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