Mark I End-Hall Ion Source

Compact Ion Assistance for Research and Pilot Production Systems

The Intlvac Mark I End-Hall Ion Source is designed for small research, development, and pilot production e-beam coating systems. Its compact footprint and stable gridless architecture make it well suited for systems requiring controlled ion assistance in limited chamber volumes. Engineered for rugged operation and low contamination performance, the Mark I provides reliable beam delivery for surface treatment and thin film modification processes in small to medium vacuum chambers.

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Mark I - Ion Source

Key Features

Reactive Gas Compatible

Supports reactive process environments
Suitable for oxygen and other reactive chemistries

Low Contamination Operation

Gridless construction minimizes particulate sources
Stable plasma generation with reduced debris

Rugged and Reliable Design

High-Curie point permanent magnet
Robust end-Hall architecture for long-term operation

Compact for Small Systems

Designed for chambers up to 60 cm
Ideal for research and pilot-scale platforms

Applications

The Mark I is intended for:

Small R&D e-beam coating systems
Pilot production coating platforms
Ion-assisted deposition processes

Surface activation and film densification
Pre-deposition substrate treatment

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Technical Specifications

Parameter

Specification

Ion Energy

50–170 eV

Beam Current

Up to 200 mA

Operating Pressure

< 3 × 10⁻⁴ Torr

Gas Requirements

3–10 sccm

Parameter

Specification

Source Dimensions (Dia. × Length)

6.4 cm × 11.4 cm

Chamber Size

Up to 60 cm

Throw Distance (Source-to-Substrate)

Up to 30 cm

Magnet

High-Curie point permanent

Cathode / Neutralizer

Immersed filament or HCES

Operational Characteristics

The Mark I employs a gridless end-Hall discharge configuration to produce a controlled, low-energy ion beam suitable for delicate substrates and thin film growth processes. Its moderate beam current and compact geometry make it appropriate for systems where chamber space and pumping capacity are limited.The option of either an immersed filament or Hollow Cathode Electron Source (HCES) allows configuration flexibility depending on operational lifetime requirements and process sensitivity.

Why Choose Intlvac Thin Film?

Intlvac Thin Film systems are built for precision coating, research flexibility, and industrial reliability. The Mark I⁺ Ion Source integrates seamlessly into: