Intlvac's Icarus system geometry ensures a very flat and uniform deposition front for superior 'lift-off' capability. From pushing the 'go' button to pulling out a finished wafer with 2u of spit-free coating takes less than 90 minutes.

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Indium Solder Bump Coating Services

High-Precision Thin Film Deposition for Advanced Microelectronic Applications

Intlvac Thin Film specializes in high-quality indium film deposition using advanced physical vapor deposition (PVD) techniques. Our process enables precise, clean, and high-performance coatings optimized for cutting-edge applications in quantum computing, focal plane arrays, low-resistance ohmic contacts, and semiconductor device fabrication.


Why Indium?

Indium is a ductile metal with a low melting point of 156.6 °C, making it ideal for low-temperature microelectronic processes that avoid damage to sensitive components. Its excellent thermal conductivity and chemical compatibility with III-V and II-VI semiconductors make it an essential material for:

  • High-performance electrical contacts
  • Efficient heat dissipation in semiconductor devices
  • Integration into complex crystal structures
  • Robust interconnects in next-generation computing systems

Advantages of PVD Indium Coatings

Compared to methods like electroplating, PVD deposition offers:

  • Superior film adhesion and density
  • Excellent thickness uniformity
  • Minimal environmental variation effects
  • Broader material compatibility
  • Precise control over thickness and morphology

Films grown at cryogenic temperatures further enhance:

  • Shear strength and adhesion
  • Columnar crystalline growth
  • Suppression of lateral atom migration

Icarus Indium Coating System

Intlvac’s Icarus platform is purpose-built for high-throughput, high-precision indium film deposition. Our proprietary system is engineered to deliver industry-leading performance, reliability, and yield.

Key Performance Features

  • Spit-free deposition up to 70 Å/s on 200 mm wafers
  • High uniformity (<5%) across 8-inch wafers
  • Textured, small-grain morphology from low-temperature deposition
  • Excellent feature resolution:
    • 5-micron feature size
    • 10-micron pixel pitch
  • High lift-off process yield:
    • Collimated flux minimizes sidewall coating
    • Enables clean pattern definition and precise feature transfer
  • Shape-flexible bump arrays:
    • Consistent indium fill for both square and round geometries

Lift-Off Process Optimization

We use negative photoresist for the lift-off process, offering:

  • Higher selectivity and process stability
  • Resistance to solvent attack during metal deposition
  • Clean lift-off edges and minimized bridging
  • Reliable pattern preservation through additional processing steps

Applications

Intlvac’s indium thin films are ideal for:

  • Quantum computing interconnects
  • Infrared focal plane arrays (FPAs)
  • Flip-chip bump bonding
  • High-reliability ohmic contact formation
    • Sensitive optoelectronic packaging

Tell us about your project using the form below, or get in touch at thinfilm@intlvac.com